Canon Kabushiki Kaisha

Manabu Matsuo

Nobumasa Suzuki

Hirohisa Oda

A plasma processing apparatus is disclosed which comprises a container which can be evacuated; a gas supply means for supplying a gas to the inside of the container; and a microwave supply means for supplying microwaves to generate a plasma in the container, the plasma being utilized to process an article, wherein the microwave supply means is a microwave applicator which is provided with an annular waveguide having a planar H-plane with a plurality of slots provided apart from each other and a rectangular cross section perpendicular to the traveling direction of microwaves and which supplies microwaves to the inside of the container through a dielectric window of the container from the plurality of slots provided in the planar H-plane, and wherein the gas supply means is provided a gas emission port through which the gas is emitted toward the planar H-plane.

Plasma processing apparatus provided with microwave applicator having annular waveguide and processing method

A substrate rotating device includes a turn table placed horizontally, a substrate supporting member provided on the turn table, for supporting a substrate with respect to a vertical direction and for regulating the position of the outside periphery of the substrate with respect to a horizontal direction, a driving mechanism causing rotation of the turn table, an opening formed in the turn table, and an evacuating mechanism rotatable as a unit with the turn table, for forcibly evacuating a space between the turn table and the substrate through the opening,

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Chiba, Japan

Manabu Matsuo