This inventor holds 13 USPTO granted patents and 7 published patent applications and 1 EPO patent. Top assignees: Db Hitek Co., Ltd., Db Hitek Co., Ltd., Dongbu Hitek Co., Ltd.. Active years: 2013-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Chungbuk, KR (2013)
- Chungcheongbuk-do, KR (2013 - 2014)
- Icheon-si, KR (2015)
- Mungyeong-si, KR (2019 - 2023)
- Gyeongsangbuk-do, KR (2023)
Company Filing History:
4 out of 137 
4 out of 24 
3 out of 854 
Years Active: 2013-2026
Title: The Innovations of Man Lyun Ha – A Visionary in Imaging Technology
Introduction
Man Lyun Ha is a notable innovator based in Mungyeong-si, South Korea, known for his significant contributions in the realm of imaging technology. With a portfolio of four patents, Ha’s work is characterized by a commitment to enhancing photon detection efficiency and sensitivity in imaging devices.
Latest Patents
Among his most recent innovations are two pivotal patents. The first patent focuses on a single-photon avalanche diode (SPAD) pixel structure and the method of manufacturing the same. This invention includes an additional PN junction arranged either vertically or horizontally, which has been designed to increase photon detection efficiency, ultimately leading to improved sensitivity within imaging devices.
The second notable patent is centered on an advanced image sensor. This innovative sensor comprises a substrate with a first conductivity type, along with various charge accumulation regions and a pinning region that contribute to its efficiency. The intricacies of these components, such as the floating diffusion region and channel region, showcase Ha's talent for intricate design and engineering in imaging technology.
Career Highlights
In his professional journey, Man Lyun Ha has made substantial strides while working with Db Hitek Co., Ltd., a company recognized for its dedication to advancing technology in semiconductor solutions. His work has not only garnered patents but also established him as an influential figure in his field.
Collaborations
Collaboration is a significant aspect of innovation, and Man Lyun Ha is no stranger to this. He has worked alongside talented professionals such as Dong Jun Oh and Jong Min Kim, contributing to shared projects and advancing their collective expertise in imaging technologies.
Conclusion
Man Lyun Ha’s contributions are paving the way for future advancements in imaging technology. His patents reflect a deep understanding of semiconductor design and efficiency, making him a key player in the field. As innovation continues to evolve, Ha’s work will undoubtedly influence the trajectory of imaging solutions for years to come.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile