Yokohama, Japan

Mamoru Nakasuji

This inventor holds 7 USPTO granted patents. Top assignees: Kabushiki Kaisha Toshiba, Tokyo Shibaura Denki Kabushiki Kaisha, Vlsi Technology Research Association. Active years: 1979-1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mamoru Nakasuji. Retrieved from https://idiyas.com/inventor/mamoru-nakasuji-22yogj1w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 5

Forward Citations = 68(Granted Patents)


Company Filing History:


Years Active: 1979-1988

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7 patents (USPTO):Explore Patents

Title: Mamoru Nakasuji: Innovator in Electron Beam Technology

Introduction

Mamoru Nakasuji is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of electron beam technology, holding a total of 7 patents. His work focuses on methods that enhance the precision and efficiency of electron beam exposure systems.

Latest Patents

One of Nakasuji's latest patents is a method of drawing a desired pattern on a target through exposure with an electron beam. This innovative technique defines a pattern area on the target surface using first units of exposed areas arranged in rows and columns, which are then exposed by a first electron beam. Additionally, a background area is defined by secondary units of exposed areas, which are exposed by a secondary electron beam to compensate for the proximity effect. This method allows for a more efficient exposure process by reducing the time required for background area exposure.

Another notable patent involves adjusting the optical column in an energy beam exposure system. In this method, the edges of a beam spot formed on a target by an electron beam are detected by rotating a first aperture mask along the optical axis. The adjustment of first and second blanking voltages minimizes the detectable intensity of the beam spot without completely blanking the electron beam. This process enhances the accuracy of the beam spot positioning, which is crucial for high-precision applications.

Career Highlights

Throughout his career, Mamoru Nakasuji has worked with notable companies such as Toshiba Corporation and Tokyo Shibaura Electric Co., Ltd. His experience in these organizations has contributed to his expertise in electron beam technology and innovation.

Collaborations

Nakasuji has collaborated with esteemed colleagues, including Hirotsugu Wada and Toshiaki Shinozaki. These partnerships have fostered advancements in their respective fields and have led to the development of cutting-edge technologies.

Conclusion

Mamoru Nakasuji's contributions to electron beam technology through his innovative patents and collaborations highlight his role as a key figure in the field. His work continues to influence advancements in precision engineering and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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