The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1980
Filed:
Jun. 15, 1978
Applicant:
Inventors:
Mamoru Nakasuji, Yokohama, JP;
Toshiaki Shinozaki, Yokohama, JP;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
A61K / ;
U.S. Cl.
CPC ...
2504 / ; 2503 / ; 2504 / ;
Abstract
Disclosed is an electron beam exposure apparatus which comprises a first deflection system for deflecting an electron beam emitted from an electron gun and an objective electron lens for converging the deflected electron beam to apply the beam to a workpiece. Interposed between the objective lens and the workpiece is a second deflection system for deflecting the electron beam in parallel with the optical axis of the apparatus.