Toshiaki Shinozaki

Title: Toshiaki Shinozaki: Innovator in Pattern Forming Technology

Introduction

Toshiaki Shinozaki is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of pattern forming technology, holding a total of 13 patents. His innovative methods have advanced the precision and efficiency of pattern formation in various applications.

Latest Patents

One of Shinozaki's latest patents is a pattern forming method utilizing a material with a photoresist film. This method involves providing a resist film on a substrate and a photosensitive film containing a photosensitive diazonium salt on the resist film. The composite is then subjected to pattern exposure using light sensitive to both the resist film and the photosensitive diazonium salt. This technique allows for the formation of minute patterns of 1 µm or less, effectively utilizing UV-ray exposure techniques with good dimensional precision and stability. Another notable patent is a method and apparatus for forming a highly precise resist pattern. This method includes applying a resist material to a substrate, baking the resist film, cooling it in a controlled manner, selectively irradiating the resist film, and developing it to form a resist pattern.

Career Highlights

Throughout his career, Toshiaki Shinozaki has worked with notable companies, including Tokyo Shibaura Denki Kabushiki Kaisha and Toshiba Corporation. His work has been instrumental in developing advanced technologies that enhance the capabilities of pattern formation.

Collaborations

Shinozaki has collaborated with esteemed colleagues such as Ichiro Mori and Yoshihide Kato. Their combined expertise has contributed to the success of various projects and innovations in the field.

Conclusion

Toshiaki Shinozaki's contributions to pattern forming technology have established him as a key figure in the industry. His innovative patents and collaborations continue to influence advancements in precision pattern formation.