The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1979
Filed:
Jun. 15, 1978
Applicant:
Inventor:
Mamoru Nakasuji, Yokohama, JP;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
A61K / ;
U.S. Cl.
CPC ...
2504 / ; 250306 ;
Abstract
Disclosed is an electron beam exposure apparatus which comprises an electron gun to produce an electron beam, a mask plate with an aperture which passes the electron beam and forms a bundle of electron beam components with a sectional shape corresponding to the shape of the aperture, and an electron lens for converging the bundle of electron beam components and applying the bundle to a workpiece. The aperture includes a tapered plane across the thickness of the mask plate, the tapered plane facing the incidence side of the electron beam.