Makoto Tsutsue

Title: Makoto Tsutsue: Innovator in Semiconductor Technology

Introduction

Makoto Tsutsue is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Tsutsue's latest patents is a multi-wafer deposition tool designed to reduce residual deposition on transfer blades. This tool features a vacuum enclosure that surrounds multiple wafer stages and includes a spindle-blade assembly for transferring wafers. The controller allows for efficient operation during both chamber clean processes and deposition cycles.

Another notable patent involves a method and apparatus for depositing a multi-sector film on the backside of a semiconductor wafer. This technology addresses substrate warpage by forming a patterned backside stress compensation film with varying stress levels across different sectors. The film can be created using a radio frequency electrode assembly or through sequential backside deposition processes.

Career Highlights

Tsutsue's career is marked by his innovative approach to semiconductor manufacturing. His patents reflect a deep understanding of the challenges faced in the industry and a commitment to developing practical solutions. His work has contributed to advancements in the efficiency of semiconductor production.

Collaborations

Throughout his career, Tsutsue has collaborated with notable colleagues, including Seiji Shimabukuro and Shunsuke Takuma. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Makoto Tsutsue is a key figure in the semiconductor industry, known for his inventive spirit and dedication to improving manufacturing processes. His patents demonstrate his expertise and commitment to advancing technology in this critical field.