Nirasaki, Japan

Makoto Okabe

This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2002-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Makoto Okabe. Retrieved from https://idiyas.com/inventor/makoto-okabe-ule2g0lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2002-2004

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2 patents (USPTO):Explore Patents

Title: Makoto Okabe: Innovator in Vacuum Processing Technology

Introduction

Makoto Okabe is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of vacuum processing technology, holding 2 patents that showcase his innovative approach to engineering.

Latest Patents

One of Okabe's latest patents is a vacuum processing apparatus designed to minimize the overall size of the equipment by reducing the floor area occupied by a vacuum pump. This etching apparatus is specifically engineered for applying an etching process on semiconductor wafers within a vacuum environment. It features a processing vessel that accommodates the semiconductor wafer and a vacuum pump positioned below the vessel, ensuring efficient gas extraction to maintain the vacuum.

Career Highlights

Okabe is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of vacuum processing systems.

Collaborations

Okabe collaborates with Hidetoshi Kimura, a fellow innovator in the field. Their partnership has led to advancements in vacuum processing technologies, further solidifying their contributions to the industry.

Conclusion

Makoto Okabe's work in vacuum processing technology exemplifies the spirit of innovation. His patents reflect a commitment to improving semiconductor manufacturing processes, making him a notable figure in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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