The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
Dec. 09, 1999
Applicant:
Inventors:
Makoto Okabe, Nirasaki, JP;
Hidetoshi Kimura, Yamanashi-ken, JP;
Assignee:
Tokyo Electron Limited, Tokyo-To, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; H01L 2/100 ;
U.S. Cl.
CPC ...
C23C 1/600 ; H01L 2/100 ;
Abstract
An object of the disclosure is to provide a vacuum processing apparatus capable of minimizing the size of the whole apparatus by reducing a floor area occupied by a vacuum pump. An etching apparatus for applying an etching process on an object to be processed in a vacuum includes a processing vessel for applying the etching process on a semiconductor wafer W introduced into the vessel and a vacuum pump arranged below the processing vessel so as to be coaxial with the processing vessel , for sucking exhaust gas in the processing vessel to form the vacuum.