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For the Inventor, By the Inventor

Tokyo, Japan

Makoto Nakase

This inventor holds 23 USPTO granted patents, primarily in Photosensitive Materials. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1993-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Makoto Nakase. Retrieved from https://idiyas.com/inventor/makoto-nakase

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23

% Patents Active = 95.7

Average Co-Inventor Count = 5.0

ph-index = 9

Forward Citations = 232(Granted Patents)


Company Filing History:

goldMedal23 out of 53,250 
 
Kabushiki Kaisha Toshiba
 patents

Years Active: 1993-2002

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Areas of Expertise:
Photosensitive Composition
Pattern Formation
Electronic Parts
Photoetching
Resist Pattern
Reticle Fabrication
Exposure Mask
Color Developing Resin
High Molecular Compound
Transparent Resin
Alkali Development
Light Exposure Method
23 patents (USPTO):Explore Patents
1. 6410748 - Alicycli c group-containing monomer (2002-06-25),
2. 6291129 - Monomer, high molecular compound and photosensitive composition (2001-09-18),
3. 6280897 - Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts (2001-08-28),
4. 6228552 - Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material (2001-05-08),
5. 6168897 - Method of forming patterns (2001-01-02),
6. 6071670 - Transparent resin, photosensitive composition, and method of forming a (2000-06-06),
7. 6060207 - Photosensitive material (2000-05-09),
8. 6045968 - Photosensitive composition (2000-04-04),
9. 5932391 - Resist for alkali development (1999-08-03),
10. 5928841 - Method of photoetching at 180 to 220 (1999-07-27),
11. 5863699 - Photo-sensitive composition (1999-01-26),
12. 5853952 - Color developing organic material, color developing resin composition (1998-12-29),
13. 5837419 - Photosensitive composition (1998-11-17),
14. 5837405 - Reticle (1998-11-17),
15. 5756254 - Resist, method of forming a resist pattern and manufacturing an (1998-05-26),

Title: The Innovative Journey of Makoto Nakase

Introduction: Makoto Nakase is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Makoto Nakase holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous commitment to innovation.

Career Highlights: With over two decades of experience in the tech industry, Nakase has worked with leading research institutions and universities to develop cutting-edge solutions that have revolutionized the way we interact with technology.

Collaborations: Throughout his career, Makoto Nakase has collaborated with top companies in Japan and internationally, fostering a culture of innovation and pushing the boundaries of what is possible in the tech world.

Conclusion: Makoto Nakase's passion for innovation and his relentless pursuit of technological advancement have solidified his position as a visionary inventor in the global tech community.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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