The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2001
Filed:
Dec. 23, 1997
Applicant:
Inventors:
Koji Asakawa, Kawasaki, JP;
Naoko Kihara, Matsudo, JP;
Naomi Shida, Kawasaki, JP;
Toru Ushirogouchi, Yokohama, JP;
Takeshi Okino, Yokohama, JP;
Makoto Nakase, Tokyo, JP;
Takuya Naito, Kawasaki, JP;
Satoshi Saito, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 ; G03F 7/30 ;
U.S. Cl.
CPC ...
G03F 7/004 ; G03F 7/30 ;
Abstract
A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation.
Asakawa, Koji. (2001). Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts (U.S. Patent No. 6280897). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6280897
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile