Kawasaki, Japan

Makoto Kosugi


Average Co-Inventor Count = 1.6

ph-index = 4

Forward Citations = 130(Granted Patents)


Location History:

  • Yokohama, JP (1982)
  • Isehara, JP (1993)
  • Kanagawa, JP (1998)
  • Kawasaki, JP (2001)

Company Filing History:


Years Active: 1982-2001

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4 patents (USPTO):Explore Patents

Title: The Innovations of Makoto Kosugi

Introduction

Makoto Kosugi is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of plasma processing, holding a total of 4 patents. His work focuses on enhancing the efficiency and effectiveness of plasma treatment methods, particularly in semiconductor manufacturing.

Latest Patents

One of his latest innovations is a plasma processing system. This system includes a signal sampling unit that measures electric signals reflecting plasma conditions. It also features a model expression memory for storing a model expression that relates the values of the electric signals to plasma processing characteristics. A computing unit substitutes the measured electric signal values into the model expression to compute predicted values of the plasma processing characteristics. Additionally, a diagnosing unit assesses the plasma condition based on these predicted values. This innovative structure allows for real-time estimation of plasma conditions, enabling operators to quickly identify changes in plasma processing characteristics and prevent the occurrence of defective wafers.

Another notable patent is a plasma treatment method designed for semiconductor devices. This method effectively reduces electron shading effects and suppresses charge damage without compromising various characteristics during the plasma process. The distance between the substrate bias electrode and the counter electrode is set to less than twice the mean free path of electrons. High-frequency electric power ranging from 100 kHz to 1 MHz is supplied to the substrate bias electrode, while a higher frequency of 1 MHz to 100 MHz is supplied to the counter electrode.

Career Highlights

Makoto Kosugi has built a successful career at Fujitsu Corporation, where he continues to innovate in the field of plasma processing. His work has been instrumental in advancing semiconductor manufacturing technologies.

Collaborations

He has collaborated with notable colleagues, including Takeshi Kamata and Hiroshi Arimoto, to further enhance the development of plasma processing technologies.

Conclusion

Makoto Kosugi's contributions to plasma processing technology have significantly impacted the semiconductor industry. His innovative patents demonstrate his commitment to improving manufacturing processes and ensuring high-quality outcomes.

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