The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2001
Filed:
Aug. 29, 1997
Makoto Kosugi, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A plasma processing system including a signal sampling unit for measuring electric signals reflecting a plasma condition; a model expression memory for storing a model expression for relating values of the electric signals with plasma processing characteristics; a computing unit for substituting the values of the electric signals measured by the signal sampling unit into the model expression read from the model expression memory to computer predicted values of the plasma processing characteristics; and a diagnosing unit for diagnosing a condition of a plasma, based on the predicted values of the plasma processing characteristics. The plasma processing system of this structure permits a condition of a plasma to be estimated by substituting realtime measured electric signals into a model expression, whereby when a change of plasma processing characteristics occurs, the operator can immediately know it. Accordingly, occurrence of a large number of defective wafers can be precluded.