Hsinchu, Taiwan

Mai-Ru Kuo


Average Co-Inventor Count = 2.3

ph-index = 3

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2000-2002

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4 patents (USPTO):Explore Patents

Title: Trailblazing Inventor Mai-Ru Kuo: Pushing Boundaries in Innovation

Introduction: Mai-Ru Kuo, a man of relentless pursuit for innovation, has solidified his position as a trailblazer in the world of inventors with his passion for creating technologies that make a difference. Hailing from Hsinchu, TW, Kuo's contributions continue to inspire the next generation of innovators to push the boundaries of what is possible in the ever-evolving tech landscape.

Latest Patents: Among his impressive portfolio of 4 patents, Mai-Ru Kuo's latest innovations include a "Method of forming a dual-layer anti-reflective coating" and a "Method for forming bottom anti-reflective coating (BARC)." The former involves a process of depositing anti-reflective coating layers using chemical vapor deposition, while the latter presents a method for forming organic anti-reflective coating on substrates.

Career Highlights: Currently working at the Worldwide Semiconductor Manufacturing Corporation, Kuo has made significant strides in the field of semiconductor technology. His expertise in developing advanced coatings and techniques has garnered him recognition as a leading figure in the industry.

Collaborations: Kuo's collaborations with coworkers like Kung Linliu and Shin-Pu Jeng have further enriched his innovative pursuits. Together, they have contributed to groundbreaking research and development projects that have pushed the boundaries of technological advancements.

Conclusion: Mai-Ru Kuo's unwavering commitment to innovation, coupled with his inventive spirit, showcases his exceptional talent as an inventor. His work not only reflects his technical prowess but also his visionary approach towards creating impactful technologies that shape the future of the tech industry. Kuo's journey serves as a beacon of inspiration for aspiring innovators worldwide, urging them to embrace challenges and strive for excellence in the realm of technology and invention.

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