Company Filing History:
Years Active: 2010
Title: Magdy S Abdelrahman: Innovator in Semiconductor Technology
Introduction
Magdy S Abdelrahman is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of hard mask materials and processes. With a total of 2 patents, his work has advanced the methods used in interlayer dielectric patterning.
Latest Patents
Abdelrahman's latest patents include innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing. The first patent, titled "Soluble hard mask for interlayer dielectric patterning," describes a method that involves forming a hard mask over an interlayer dielectric layer, patterning the hard mask, etching the dielectric layer, and subsequently removing the hard mask using a selective wet etchant. This process ensures that the hard mask is etched at a greater rate than the underlying dielectric layer, improving manufacturing precision. The second patent, "Hard mask for low-k interlayer dielectric patterning," details a hard mask designed to reduce adhesion to anti-reflective materials. This innovation allows for the removal of anti-reflective materials with minimal damage to the interlayer dielectric layer beneath the hard mask.
Career Highlights
Magdy S Abdelrahman is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor technology. His work at Intel has positioned him as a key player in the development of advanced manufacturing techniques that are crucial for the production of modern electronic devices.
Collaborations
Throughout his career, Abdelrahman has collaborated with talented individuals such as Makarem A Hussein and Tony V Mule. These collaborations have fostered an environment of innovation and have contributed to the successful development of his patented technologies.
Conclusion
Magdy S Abdelrahman is a distinguished inventor whose contributions to semiconductor technology have made a lasting impact. His innovative patents and work at Intel Corporation exemplify his commitment to advancing the field.
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