The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Sep. 28, 2006
Applicants:
Tony V. Mule, Hillsboro, OR (US);
Magdy S. Abdelrahman, Santa Clara, CA (US);
Inventors:
Tony V. Mule, Hillsboro, OR (US);
Magdy S. Abdelrahman, Santa Clara, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/52 (2006.01); H01L 23/48 (2006.01); H01L 29/40 (2006.01); H01L 21/3105 (2006.01); H01L 21/768 (2006.01); H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
Described herein are embodiments of a hard mask including a surface to reduce adhesion to an anti-reflective material deposited on a surface, wherein the surface to reduced adhesion provides use of a process to remove the anti-reflective material deposited on the surface that minimizes damage to an interlayer dielectric layer below the hard mask and methods of manufacturing the same.
Mule, Tony. (2010). Hard mask for low-k interlayer dielectric patterning (U.S. Patent No. 7649264). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7649264
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile