Company Filing History:

11 out of 34

Ontrak Systems, Inc.

patents

3 out of 3,768

Lam Research Corporation

where one patent can have more than one assignee

Years Active: 1995-2002

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14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6334229 - Apparatus for cleaning edges of contaminated substrates (2002-01-01),

2. 6272712 - Brush box containment apparatus (2001-08-14),

3. 6119295 - Brush assembly apparatus (2000-09-19),

4. 6059889 - Method for processing a substrate using a system having a roller with (2000-05-09),

5. 5924154 - Brush assembly apparatus (1999-07-20),

6. 5862560 - Roller with treading and system including the same (1999-01-26),

7. 5861066 - Method and apparatus for cleaning edges of contaminated substrates (1999-01-19),

8. 5809832 - Roller positioning apparatus (1998-09-22),

9. 5794299 - Containment apparatus (1998-08-18),

10. 5762084 - Megasonic bath (1998-06-09),

11. 5745946 - Substrate processing system (1998-05-05),

12. 5727332 - Contamination control in substrate processing system (1998-03-17),

13. 5606251 - Method and apparatus for detecting a substrate in a substrate processing (1997-02-25),

14. 5475889 - Automatically adjustable brush assembly for cleaning semiconductor wafers (1995-12-19),

Title: Lynn S Ryle: Innovator in Semiconductor Processing Technology

Introduction

Lynn S Ryle is a prominent inventor based in San Jose, California, known for her significant contributions to semiconductor processing technology. With a total of 14 patents to her name, she has developed innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among her latest patents is the "Apparatus for cleaning edges of contaminated substrates." This invention describes a cleaning mechanism that effectively removes particles from the edges of wafers using friction and a difference in tangential velocity at the contact point. Another notable patent is the "Brush box containment apparatus," which is designed for semiconductor processing systems. This system allows for simultaneous scrubbing of both sides of a wafer and includes a containment apparatus for use with highly acidic or volatile chemical solutions, along with a roller positioning apparatus and a brush placement device.

Career Highlights

Lynn has worked with several notable companies in the semiconductor industry, including Ontrak Systems, Inc. and Lam Research Corporation. Her work in these organizations has been instrumental in advancing semiconductor processing technologies.

Collaborations

Throughout her career, Lynn has collaborated with talented individuals such as David L Thrasher and Thomas R Gockel, contributing to the development of innovative solutions in her field.

Conclusion

Lynn S Ryle's contributions to semiconductor processing technology through her patents and collaborations highlight her role as a leading inventor in the industry. Her work continues to influence advancements in semiconductor manufacturing processes.

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