Lutz Aschke

Title: The Innovative Mind of Lutz Aschke

Introduction

Lutz Aschke, an accomplished inventor located in Mainz, Germany, is credited with four notable patents that advance technology in the field of extreme ultraviolet (EUV) lithography. His expertise and innovative approaches have made significant contributions to micro-lithography processes, emphasizing his role as a pivotal figure in the industry.

Latest Patents

Among his latest inventions is a mask blank for use in EUV lithography and a method for its production. This innovative mask blank consists of a substrate featuring a front side coated for use as a mask and a rear side that includes an electrically conductive coating. This coating is not only abrasion-resistant but also features strong adhesion, adhering to multiple German Industry Standards. The application of the electrically conductive coating via ion-beam-assisted sputtering allows the mask blank to be handled using electrostatic holding devices effectively.

Another significant invention by Aschke is a substrate for micro-lithography and the process of manufacturing it. This substrate features a base layer with a low coefficient of thermal expansion (CTE) topped with at least one semiconductor material cover layer, ideally a silicon layer applied through ion beam sputtering. This innovative process allows for the creation of substrates that boast extremely accurate shapes and minimal surface roughness, advancing the potential of EUV micro-lithography.

Career Highlights

Throughout his career, Lutz Aschke has been associated with distinguished companies such as Schott AG and Aixuv GmbH. His work at these institutions has provided him with a wealth of experience and exposure to cutting-edge developments within the realm of lithography.

Collaborations

Among Lutz Aschke's collaborators are Jochen Alkemper and Markus Schweizer. Working alongside such esteemed professionals has likely contributed to the depth and breadth of his innovations and patents.

Conclusion

Lutz Aschke's contributions to the field of micro-lithography reflect his dedication to innovation and technology. His patents, focusing on crucial components such as mask blanks and substrates, showcase his ability to push the boundaries of what is possible in lithographic processes. Aschke's work continues to influence the landscape of EUV lithography and serves as an inspiration for future inventors and engineers in the industry.