Lung-Hsiang Chuang

Title: Innovations of Lung-Hsiang Chuang in Semiconductor Testing

Introduction

Lung-Hsiang Chuang is a notable inventor based in Shiao-Chia, Taiwan. He has made significant contributions to the field of semiconductor testing, particularly through his innovative patent. His work is essential for improving the reliability and efficiency of semiconductor devices.

Latest Patents

Lung-Hsiang Chuang holds a patent titled "Method for stud pull test for film formed on semiconductor device." This patent describes a process for preparing a test sample that includes a film and an underlying substrate, which represents part of a semiconductor wafer. The method involves maintaining the sample in boiling salt water for several hours. After attaching an epoxy stud to the film and baking the clamped assembly for about an hour, the stud is firmly attached. In a conventional pull test, the film typically breaks loose from the substrate before the stud breaks from the film, showcasing the effectiveness of this method.

Career Highlights

Chuang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to advancements in semiconductor technology and testing methodologies.

Collaborations

Lung-Hsiang Chuang has collaborated with notable colleagues, including Chung-Long Chang and Syun-Ming Jang. These collaborations have likely enhanced the innovation process and contributed to the development of effective testing methods in the semiconductor field.

Conclusion

Lung-Hsiang Chuang's contributions to semiconductor testing through his innovative patent demonstrate his expertise and commitment to advancing technology in this critical industry. His work continues to impact the reliability of semiconductor devices significantly.