Luigi Mariucci

Title: The Innovations of Inventor Luigi Mariucci

Introduction

Luigi Mariucci, an accomplished inventor based in Rome, Italy, has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, his work primarily focuses on the manufacturing processes of large-scale integration MOS (Metal-Oxide-Semiconductor) devices. Mariucci’s inventions demonstrate his expertise and dedication to advancing semiconductor manufacturing techniques.

Latest Patents

Luigi Mariucci's latest patents include a pioneering process for manufacturing a large-scale integration MOS device. This innovative process revolves around the creation of a MOS device that involves several critical steps. Firstly, a gate structure is formed above a semiconductor layer. A first doped region is created within a specific surface portion of the semiconductor layer. The next vital step involves irradiating this doped region with electromagnetic radiation, which is essential for the annealing process. Furthermore, before the irradiation step, a dielectric mirror—potentially of the Bragg-reflector type—is established above a different surface portion of the semiconductor layer. This mirror reflects part of the electromagnetic radiation, thereby protecting the underlying regions from exposure.

Career Highlights

Throughout his career, Luigi Mariucci has contributed his skills to notable organizations, including STMicroelectronics S.r.l. and the Consiglio Nazionale delle Ricerche. His tenure with these institutions has allowed him to develop and refine his innovative concepts, leading to his impactful patents in semiconductor technology.

Collaborations

Mariucci's journey in innovation is marked by fruitful collaborations with talented colleagues, notably Guglielmo Fortunato and Dario Salinas. Together, they have worked towards pushing the boundaries of semiconductor research and development.

Conclusion

Luigi Mariucci’s work in the field of semiconductor technology serves as a testament to his ingenuity and dedication. With his three patents, he has established himself as a prominent figure in the manufacturing of MOS devices. His contributions pave the way for future innovations in the semiconductor industry, making a lasting impact on technology as a whole.