This inventor holds 2 USPTO granted patents and 4 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Ludovico Megalini: Innovator in Wafer Thickness Correction
Introduction
Ludovico Megalini is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer thickness correction. His innovative approach has led to the development of a unique patent that addresses challenges in the manufacturing process.
Latest Patents
Ludovico holds a patent titled "Wafer total thickness variation using maskless implant." This invention focuses on localized wafer thickness correction. The method involves providing a substrate with an upper surface that has a raised portion and a non-raised portion. A metrology scan is performed to determine the dimensions of both portions. Subsequently, a hardmask is deposited over the surface, and ions are directed to the hardmask with varying doses. The process concludes with an etching step that selectively removes the hardmask over the raised portion while retaining it over the non-raised portion. This innovative technique enhances the precision of wafer manufacturing.
Career Highlights
Ludovico Megalini is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to apply his expertise in wafer technology and contribute to advancements in the field. With a patent portfolio that includes 1 patent, he continues to push the boundaries of innovation in semiconductor manufacturing.
Collaborations
Ludovico collaborates with Qintao Zhang, a fellow innovator in the field. Their partnership exemplifies the collaborative spirit that drives innovation in technology.
Conclusion
Ludovico Megalini's contributions to wafer thickness correction demonstrate his commitment to advancing semiconductor technology. His innovative patent reflects his expertise and dedication to improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
