Zurich, Switzerland

Luciano Beffa

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 2.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Zurich, CH (2023)
  • Zürich, CH (2022 - 2024)

Company Filing History:


Years Active: 2022-2025

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5 patents (USPTO):Explore Patents

Title: Innovations of Luciano Beffa

Introduction

Luciano Beffa is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of technology, particularly in the area of light source control and image feature matching. With a total of five patents to his name, Beffa's work showcases his innovative approach to solving complex problems.

Latest Patents

One of Beffa's latest patents is titled "System and method for controlling a light source for illuminating a scene of interest." This invention relates to a method for controlling a light source using pose estimates from a camera, landmark maps, and an illumination model. The method optimizes the emission illumination power and determines the appropriate illumination time course for effective lighting.

Another significant patent is "System and method for matching of image features with indistinguishable landmarks." This method involves matching features in an image with representations in a landmark map. It includes extracting features from images, creating policies for matching decisions, and selecting the best policy based on cost functions.

Career Highlights

Luciano Beffa has established himself as a key figure in his field through his innovative patents and contributions to technology. His work at Verity Ag has allowed him to explore and develop advanced methods that enhance the functionality of light sources and image processing.

Collaborations

Beffa collaborates with talented individuals such as Markus Florian Hehn and Fabio Rossetto. Their combined expertise fosters an environment of creativity and innovation, leading to groundbreaking advancements in their respective fields.

Conclusion

Luciano Beffa's contributions to technology through his patents reflect his dedication to innovation and problem-solving. His work continues to influence the industry and inspire future advancements.

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