This inventor holds 4 USPTO granted patents. Top assignee: Asm International N.v.. Active years: 2015-2020.
Company Filing History:
Years Active: 2015-2020
Title: Lucia D'Urzo: Innovator in Atomic Layer Deposition Technology
Introduction
Lucia D'Urzo is a prominent inventor based in Brussels, Belgium. She has made significant contributions to the field of materials science, particularly in the area of atomic layer deposition. With a total of 4 patents to her name, D'Urzo continues to push the boundaries of innovation in her field.
Latest Patents
One of her latest patents focuses on the atomic layer deposition of antimony oxide films. This technology involves depositing antimony oxide thin films using an antimony reactant and an oxygen source. The antimony reactants can include antimony halides, such as SbCl, antimony alkylamines, and antimony alkoxides like Sb(OEt). The oxygen source may be ozone, and in some cases, the antimony oxide thin films are deposited in a batch reactor. These films can serve various purposes, such as etch stop layers or sacrificial layers.
Career Highlights
Lucia D'Urzo is currently employed at ASM International N.V., where she continues to develop innovative solutions in her area of expertise. Her work has garnered attention for its potential applications in various industries, including electronics and materials engineering.
Collaborations
Throughout her career, D'Urzo has collaborated with notable colleagues, including Raija H Matero and Linda Lindroos. These partnerships have contributed to her success and the advancement of her research.
Conclusion
Lucia D'Urzo is a trailblazer in the field of atomic layer deposition technology. Her innovative patents and collaborations highlight her commitment to advancing materials science. Her work continues to inspire future generations of inventors and researchers.