The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2018

Filed:

Nov. 22, 2016
Applicant:

Asm International N.v., Almere, NL;

Inventors:

Raija H. Matero, Helsinki, FI;

Linda Lindroos, Helsinki, FI;

Hessel Sprey, Kessel-Lo, BE;

Jan Willem Maes, Wilrijk, BE;

David de Roest, Kessel-Lo, BE;

Dieter Pierreux, Dilbeek, BE;

Kees van der Jeugd, Heverlee, BE;

Lucia D'Urzo, Brussels, BE;

Tom E. Blomberg, Vantaa, FI;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/28 (2006.01); H01L 29/51 (2006.01); H01L 21/22 (2006.01); C23F 1/26 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); H01L 21/02175 (2013.01); H01L 21/02274 (2013.01); H01L 21/0332 (2013.01); H01L 21/2225 (2013.01); H01L 21/28194 (2013.01); H01L 21/31111 (2013.01); H01L 21/31122 (2013.01); H01L 29/513 (2013.01); H01L 29/517 (2013.01); C23F 1/26 (2013.01);
Abstract

Antimony oxide thin films are deposited by atomic layer deposition using an antimony reactant and an oxygen source. Antimony reactants may include antimony halides, such as SbCl, antimony alkylamines, and antimony alkoxides, such as Sb(OEt). The oxygen source may be, for example, ozone. In some embodiments the antimony oxide thin films are deposited in a batch reactor. The antimony oxide thin films may serve, for example, as etch stop layers or sacrificial layers.


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