Lu-Wei Kuo

Title: Lu-Wei Kuo: Innovator in Overlay Mark Structure Technology

Introduction

Lu-Wei Kuo is a notable inventor based in Yilan County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of overlay mark structures. His innovative methods have implications for improving measurement accuracy in various applications.

Latest Patents

Lu-Wei Kuo holds a patent for a "Method of forming overlay mark structure." This method involves several steps, including the formation of an insulation layer on a substrate, the creation of a first overlay mark within that layer, and the application of a metal layer that covers both the insulation layer and the first overlay mark. The process ensures that the top surface of the first overlay mark is lower than that of the insulation layer after the metal layer is removed. This design helps avoid measurement inaccuracies and related defects.

Career Highlights

Throughout his career, Lu-Wei Kuo has worked with prominent companies in the semiconductor industry. He has been associated with United Microelectronics Corporation and Fujian Jinhua Integrated Circuit Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in technology.

Collaborations

Lu-Wei Kuo has collaborated with several talented individuals in his field. Notable coworkers include Zheng-Feng Chen and Sho-Shen Lee, who have also contributed to various projects and innovations in semiconductor technology.

Conclusion

Lu-Wei Kuo's work in developing overlay mark structures showcases his innovative spirit and dedication to advancing semiconductor technology. His contributions are vital for enhancing measurement accuracy and reducing defects in related applications.