Hubei, China

Lu Ming Fan


Average Co-Inventor Count = 5.2

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Wuhan, CN (2021)
  • Hubei, CN (2020 - 2022)

Company Filing History:


Years Active: 2020-2025

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4 patents (USPTO):

Title: Innovations of Lu Ming Fan in Semiconductor Technology

Introduction

Lu Ming Fan is a prominent inventor based in Hubei, China, known for his contributions to semiconductor technology. He holds a total of four patents, showcasing his expertise and innovative spirit in the field. His work has significantly impacted the development of advanced semiconductor structures.

Latest Patents

One of Lu Ming Fan's latest patents is titled "Method and structure for cutting dense line patterns using self-aligned double patterning." This method involves forming a plurality of mandrel lines on a first dielectric layer and creating groups of discontinuous mandrel line pairs using a first mask. The process includes disposing of a second dielectric layer and forming dielectric spacers on the sidewalls of the mandrel lines and the discontinuous mandrel line pairs. Subsequently, the mandrel lines and the discontinuous mandrel line pairs are removed to create spacer masks. The method further details forming blocked regions with a second mask and creating openings through the first dielectric layer using the conjunction of the spacer masks and the second mask. Finally, the spacer masks and the second mask are removed, allowing for the disposal of an objective material in the openings and the formation of objective lines with top surfaces coplanar with the first dielectric layer.

Career Highlights

Lu Ming Fan is currently employed at Yangtze Memory Technologies Co., Ltd., where he continues to innovate in semiconductor technology. His work at this company has positioned him as a key player in the industry, contributing to advancements that enhance semiconductor manufacturing processes.

Collaborations

Some of Lu Ming Fan's notable coworkers include Zi Qun Hua and Bi Feng Li, who collaborate with him on various projects within the company. Their teamwork fosters an environment of innovation and creativity, leading to significant advancements in their field.

Conclusion

Lu Ming Fan's contributions to semiconductor technology through his patents and work at Yangtze Memory Technologies Co., Ltd. highlight his role as an influential inventor. His innovative methods continue to shape the future of semiconductor manufacturing.

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