Brossard, Canada

Lu Han


Average Co-Inventor Count = 6.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Montreal, CA (2016)
  • Brossard, CA (2016)

Company Filing History:

goldMedal3 out of 832,812 
Other
 patents

Years Active: 2016

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3 patents (USPTO):Explore Patents

Title: Innovations of Inventor Lu Han

Introduction

Lu Han is a notable inventor based in Brossard, Canada. He has made significant contributions to the field of materials science and engineering, particularly in the development of advanced microstructures and optical devices. With a total of three patents to his name, Lu Han continues to push the boundaries of innovation.

Latest Patents

Lu Han's latest patents include "Electron sensitive glass and optical circuits, microstructures formed therein." This invention provides an electron definable glass for microstructures, which includes optical waveguides formed through electron beam irradiation followed by heat treatment and chemical etching. Another significant patent is "Process for forming gate of thin film transistor devices." This process enhances the mechanical strength and reduces the gate length for high electron mobility transistors, incorporating innovative techniques to improve device performance.

Career Highlights

Throughout his career, Lu Han has demonstrated a commitment to advancing technology through his inventive work. His patents reflect a deep understanding of materials and their applications in modern electronics. His innovative approaches have garnered attention in the scientific community and have potential applications in various industries.

Collaborations

Lu Han has collaborated with talented individuals such as Cindy Xing Qiu and Ishiang Shih. These collaborations have likely contributed to the success of his projects and the development of his patents.

Conclusion

Lu Han is an accomplished inventor whose work in electron sensitive materials and thin film transistors showcases his innovative spirit. His contributions to technology are significant and continue to influence the field of materials science.

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