Lourdes Dominguez

Title: Innovations by Lourdes Dominguez in Semiconductor Processing

Introduction

Lourdes Dominguez is an accomplished inventor based in Beaverton, OR (US). She has made significant contributions to the field of semiconductor processing, particularly in the development of etching solutions for metal hard mask materials. With a total of 2 patents, her work has garnered attention for its innovative approach and practical applications.

Latest Patents

Lourdes Dominguez's latest patents focus on a composition for etching a metal hard mask material in semiconductor processing. The etching solution comprises a mixture of a dilute HF (hydrofluoric acid) and a silicon-containing precursor. Additionally, the etching solution includes a surfactant agent, a carboxylic acid, and a copper corrosion inhibitor. This formulation is designed to selectively etch the metal hard mask material, such as Titanium, while suppressing the etching of Tungsten, Copper, oxide dielectric material, and carbon-doped oxide.

Career Highlights

Lourdes is currently employed at Intel Corporation, where she continues to push the boundaries of semiconductor technology. Her work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Lourdes collaborates with her coworker, Nabil G Mistkawi, to further advance their research and development efforts in the semiconductor field.

Conclusion

Lourdes Dominguez's innovative contributions to semiconductor processing exemplify her expertise and dedication to advancing technology. Her patents reflect a commitment to improving manufacturing processes and enhancing the performance of semiconductor devices.