Long Lin

Title: Long Lin: Innovator in Semiconductor Technology

Introduction

Long Lin is a prominent inventor based in Sunnyvale, CA, known for his contributions to semiconductor technology. He holds a total of 3 patents that showcase his innovative methods in forming stacks of semiconductor layers. His work has significantly impacted the field, providing new techniques for enhancing semiconductor structures.

Latest Patents

One of Long Lin's latest patents involves a method of forming a stack of multiple deposited semiconductor layers. This method includes depositing a first silicon oxide layer on a substrate, followed by a first silicon layer on the silicon oxide layer. Additionally, a first silicon nitride layer is deposited on the first silicon layer, and a second silicon layer is added on top of the first silicon nitride layer. The process also includes depositing a stress layer on the opposite side of the substrate, which helps in forming a robust structure of semiconductor layers. Another patent describes similar methods aimed at reducing stress in the semiconductor layers, further enhancing their performance and reliability.

Career Highlights

Long Lin has worked with notable companies such as Applied Materials, Inc. and Walmart Apollo, LLC. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in semiconductor technology.

Collaborations

Throughout his career, Long Lin has collaborated with talented individuals, including Liyan Miao and Chentsau Chris Ying. These partnerships have fostered a creative environment that has led to innovative solutions in the semiconductor industry.

Conclusion

Long Lin's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing the field. His patents and collaborations reflect his commitment to improving semiconductor structures, making him a valuable contributor to the industry.