This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignee: Applied Materials, Inc.. Active years: 2000-2005.
Company Filing History:
Years Active: 2000-2005
Title: The Innovative Contributions of Lolita L Sharp
Introduction
Lolita L Sharp is a prominent inventor based in Los Gatos, California. She has made significant contributions to the field of substrate processing chambers, holding a total of three patents. Her work focuses on enhancing the performance and durability of chamber components through innovative designs and materials.
Latest Patents
One of her latest patents is titled "Chamber having components with textured surfaces and method of manufacture." This invention involves a component for a substrate processing chamber that features a structure composed of aluminum oxide. The structure has a roughened surface with a roughness average ranging from about 150 to about 450 microinches. A plasma sprayed ceramic coating of aluminum oxide is deposited on this roughened surface, which may serve as a dome-shaped ceiling of the chamber.
Another notable patent is "Chamber components having textured surfaces and method of manufacture." This invention describes a domed enclosure wall for a plasma processing chamber made from a dielectric material. The wall has a roughened surface with a similar roughness average, and a plasma sprayed ceramic coating is applied to enhance its performance. This textured surface allows for better adherence of sputtered material generated by plasma, improving the efficiency of the processing chamber.
Career Highlights
Lolita L Sharp is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. Her innovative work has contributed to advancements in plasma processing technology, making her a valuable asset to her team and the industry.
Collaborations
Throughout her career, Lolita has collaborated with notable colleagues, including Shyh-Nung Steve Lin and Mark D Menzie. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Lolita L Sharp's contributions to the field of substrate processing chambers exemplify her innovative spirit and dedication to advancing technology. Her patents reflect her expertise and commitment to improving the efficiency and effectiveness of plasma processing systems.