The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2005

Filed:

Mar. 24, 2004
Applicants:

Shyh-nung Lin, Los Gatos, CA (US);

Mark D. Menzie, Sunnyvale, CA (US);

Joe F. Sommers, San Jose, CA (US);

Daniel Owen Clawson, Santa Clara, CA (US);

Glen T. Mori, Pacifica, CA (US);

Lolita L. Sharp, Los Gatos, CA (US);

Inventors:

Shyh-Nung Lin, Los Gatos, CA (US);

Mark D. Menzie, Sunnyvale, CA (US);

Joe F. Sommers, San Jose, CA (US);

Daniel Owen Clawson, Santa Clara, CA (US);

Glen T. Mori, Pacifica, CA (US);

Lolita L. Sharp, Los Gatos, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B001/08 ; B32B017/06 ; H01L021/306 ; C23C016/00 ; C23C014/00 ;
U.S. Cl.
CPC ...
Abstract

A component for a substrate processing chamber has a structure composed of aluminum oxide. The structure has a roughened surface having a roughness average of from about 150 to about 450 microinches. A plasma sprayed ceramic coating of aluminum oxide is deposited on the roughened surface of the structure. The component may be a dome shaped ceiling of the chamber.


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