Santa Clara, CA, United States of America

Daniel Owen Clawson



Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 59(Granted Patents)


Location History:

  • Mountain View, CA (US) (2000)
  • Santa Clara, CA (US) (2004 - 2005)

Company Filing History:


Years Active: 2000-2005

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3 patents (USPTO):Explore Patents

Title: The Innovations of Daniel Owen Clawson

Introduction

Daniel Owen Clawson is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of substrate processing chambers, holding a total of three patents. His work focuses on enhancing the performance and durability of chamber components through innovative designs and materials.

Latest Patents

Clawson's latest patents include a "Chamber having components with textured surfaces and method of manufacture." This invention features a component for a substrate processing chamber composed of aluminum oxide, with a roughened surface that has a roughness average ranging from about 150 to about 450 microinches. A plasma sprayed ceramic coating of aluminum oxide is deposited on this roughened surface, which may serve as a dome-shaped ceiling of the chamber. Another patent, "Chamber components having textured surfaces and method of manufacture," describes a domed enclosure wall for a plasma processing chamber made from a dielectric material. This wall also has a roughened surface with similar roughness specifications and is designed to improve the adherence of sputtered material generated by plasma.

Career Highlights

Clawson is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to focus on developing advanced technologies that enhance the efficiency and effectiveness of processing chambers.

Collaborations

Throughout his career, Clawson has collaborated with esteemed colleagues such as Glen T Mori and Shyh-Nung Steve Lin. These collaborations have contributed to the advancement of technologies in the field of substrate processing.

Conclusion

Daniel Owen Clawson's innovative patents and contributions to the field of substrate processing chambers highlight his expertise and commitment to advancing technology. His work continues to influence the industry and improve the performance of processing equipment.

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