This inventor holds 5 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2000-2009.
Location History:
- San Jose, CA (US) (2000 - 2002)
- Saratoga, CA (US) (2008 - 2009)
Company Filing History:
Years Active: 2000-2009
Title: The Innovative Contributions of Lisa L. Yang
Introduction
Lisa L. Yang is a prominent inventor based in San Jose, CA. She has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. Her work focuses on advanced metallization techniques that enhance the performance and reliability of integrated circuits.
Latest Patents
One of her latest patents involves the process of forming metal silicide on silicon-containing features of a substrate. In this innovation, a metal silicide layer is created on silicon features within a chamber. A metal film is sputter deposited on the substrate, and a portion of this film undergoes silicidation. The process utilizes energized sputtering gas to deposit metal from a target onto the substrate. The substrate is then heated to a silicidation temperature exceeding about 200°C to form a combined sputtered metal and metal silicide layer. The remaining sputtered metal can also be silicided by maintaining the substrate at this temperature.
Another notable patent addresses the magnetron sputtered metallization of a nickel silicon alloy, which serves as a solder bump barrier. This barrier layer is crucial for preventing issues between metal bonding pads on integrated circuits and tin-based solder balls. The nickel silicon alloy contains at least 2 wt % silicon and is deposited using magnetron sputtering techniques. This innovation has proven to provide superior under-bump metallization with lead-free tin solder bumps.
Career Highlights
Lisa L. Yang is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work has significantly impacted the development of advanced materials and processes used in modern electronics.
Collaborations
Throughout her career, Lisa has collaborated with several talented individuals, including Jianxin Lei and Yanping Li. These collaborations have further enhanced her research and development efforts in semiconductor technology.
Conclusion
Lisa L. Yang's innovative contributions to semiconductor technology demonstrate her expertise and commitment to advancing the field. Her patents reflect a deep understanding of materials and processes that are essential for the future of electronics.