Company Filing History:
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Years Active: 2014-2018
Title: Linwei Yu: Innovator in Semiconductor Nanostructures
Introduction
Linwei Yu is a prominent inventor based in Palaiseau, France. He has made significant contributions to the field of semiconductor technology, particularly in the development of nanostructures. With a total of 2 patents, his work focuses on innovative methods for producing advanced semiconductor devices.
Latest Patents
Linwei Yu's latest patents include a method for the low-temperature production of radial-junction semiconductor nanostructures and a method for making side growth semiconductor nanowires. The first patent outlines a process that involves forming metal aggregates on a substrate, growing doped semiconductor nanowires, and chemically depositing thin films to create radial electronic junctions. The second patent describes a technique for fabricating semiconductor nanowires on a substrate with a metallic oxide layer, utilizing hydrogen plasma and low-temperature plasma-assisted deposition to achieve lateral growth of nanowires.
Career Highlights
Throughout his career, Linwei Yu has worked with esteemed institutions such as Ecole Polytechnique and the Centre National de la Recherche Scientifique. His research has significantly advanced the understanding and application of semiconductor nanostructures in various technologies.
Collaborations
Linwei Yu has collaborated with notable professionals in his field, including Pere Roca I Cabarrocas. These partnerships have further enriched his research and innovation efforts.
Conclusion
Linwei Yu's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in nanostructure applications.