Linlin Ma

Title: Linlin Ma - Innovator in Photoetching Technology

Linlin Ma is a prominent inventor based in Shanghai, China. She has made significant contributions to the field of lithography through her innovative patent. Her work focuses on enhancing the efficiency and effectiveness of photoetching apparatuses.

Latest Patents

Linlin Ma holds a patent for a photoetching apparatus and method. This lithography apparatus includes at least two exposure devices and one substrate device. The substrate device consists of a substrate stage and a substrate supported by the substrate stage. The two exposure devices are symmetrically positioned above the substrate, allowing them to simultaneously create two exposure fields. This design enables the exposure of portions of the substrate within the defined exposure fields, improving the overall lithography process.

Career Highlights

Linlin Ma is associated with Shanghai Micro Electronics Equipment (Group) Co., Ltd. Her role in the company has allowed her to work on cutting-edge technologies in the semiconductor manufacturing industry. With her expertise, she has contributed to advancements that are crucial for the development of microelectronics.

Collaborations

Linlin Ma collaborates with notable colleagues, including Chang Jin Zhou and Zhiyong Yang. These partnerships enhance her research and development efforts, fostering innovation in the field of photoetching technology.

Conclusion

Linlin Ma is a trailblazer in the realm of lithography, with her patent showcasing her innovative spirit and technical expertise. Her contributions are vital to the advancement of microelectronics, and her work continues to influence the industry positively.