Shanghai Micro Electronics Equipment (group) Co., Ltd.

Linlin Ma

Chang Jin Zhou

Zhiyong Yang

The lithography apparatus includes at least two exposure devices and one substrate device. The substrate device includes a substrate stage and a substrate supported by the substrate stage. The at least two exposure devices are disposed in symmetry to each other above the substrate with respect to a direction for scanning exposure and configured to simultaneously create two exposure fields onto the substrate to expose the portions of the substrate within the exposure fields.

Growing community of inventors

Shanghai, China

Linlin Ma