Linh Dang

Title: Linh Dang: Innovator in Semiconductor Technology

Introduction

Linh Dang is a notable inventor based in Lawndale, California, recognized for his contributions to semiconductor technology. With a total of two patents to his name, he has made significant strides in the field of high electron mobility transistors.

Latest Patents

Linh's latest patents include a high electron mobility transistor semiconductor device and its fabrication method. The method involves forming a semiconductor device on a semiconductor substrate by depositing a photoresist layer. A window is created in the photoresist layer using electron beam lithography. Subsequently, a conformal layer is deposited on the photoresist layer and within the window. The process concludes with the selective removal of the conformal layer from the photoresist layer and a bottom portion of the window, resulting in the formation of dielectric sidewalls within the window.

Career Highlights

Linh Dang is currently employed at Northrop Grumman Space & Mission Systems Corporation, where he continues to innovate in the semiconductor sector. His work has been instrumental in advancing the capabilities of semiconductor devices.

Collaborations

Linh collaborates with talented individuals such as Wayne Yoshida and Jennifer Wang, who contribute to the innovative environment at Northrop Grumman.

Conclusion

Linh Dang's work in semiconductor technology exemplifies the spirit of innovation and collaboration in the field. His patents reflect a commitment to advancing technology and improving device performance.