Lin Xu

Title: Lin Xu: Innovator in Plasma Technology

Introduction

Lin Xu is a prominent inventor based in Houston, TX, known for his contributions to plasma technology. With a total of 7 patents, he has made significant advancements in the field, particularly in the development of devices that enhance plasma processes.

Latest Patents

One of Lin Xu's latest patents is titled "Hollow cathode device and method for using the device to control the uniformity of a plasma process." This invention describes a chamber component designed to be coupled to a processing chamber. The component includes one or more adjustable gas passages that introduce a process gas into the chamber. The adjustable gas passage can form a hollow cathode, which creates a hollow cathode plasma in a designated region. This region features one or more plasma surfaces that interact with the hollow cathode plasma. Notably, at least one of these plasma surfaces is movable, allowing for the variation of the hollow cathode region's size and the adjustment of the hollow cathode plasma's properties. Additionally, multiple adjustable hollow cathodes can be employed to fine-tune plasma processes for substrate treatment.

Career Highlights

Lin Xu has worked with notable organizations, including Tokyo Electron Limited and the University of Houston System. His experience in these institutions has contributed to his expertise in plasma technology and innovation.

Collaborations

Throughout his career, Lin Xu has collaborated with esteemed colleagues such as Lee Chen and Ronald Victor Bravenec. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Lin Xu's work in plasma technology exemplifies the spirit of innovation and the pursuit of excellence in engineering. His patents and collaborations continue to influence the field, paving the way for future advancements.