Dublin, CA, United States of America

Lin Cui


Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2018

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3 patents (USPTO):Explore Patents

Title: Innovations by Lin Cui: A Pioneer in Plasma Chemical Vapor Deposition

Introduction

Lin Cui is an accomplished inventor based in Dublin, California. He has made significant contributions to the field of plasma chemical vapor deposition systems. With a total of 3 patents to his name, Lin has demonstrated his expertise and innovative spirit in developing advanced technologies.

Latest Patents

Lin Cui's latest patents include groundbreaking methods and apparatuses aimed at improving the efficiency and effectiveness of chemical vapor deposition systems. One of his notable inventions focuses on eliminating first wafer metal contamination effects. This patent describes a two-stage process involving a low bias and a high bias stage, which enhances the conditioning of chambers. The method also includes clamping a protective electrostatic chuck cover to a pedestal by applying a bias during the high bias stage while simultaneously cooling the cover.

Another significant patent addresses edge roughness reduction. This method involves processing a stack with an etch layer beneath a mask. The mask is treated using a treatment gas that combines sputtering and trimming gases. By providing pulsed TCP power and a pulsed bias, Lin's invention creates a plasma that effectively trims the mask while maintaining its integrity.

Career Highlights

Lin Cui is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his innovative ideas and contribute to the advancement of technology in the field.

Collaborations

Throughout his career, Lin has collaborated with talented individuals such as Zhongkui Tan and Qian Fu. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Lin Cui's contributions to the field of plasma chemical vapor deposition are noteworthy. His innovative patents and collaborative efforts at Lam Research Corporation highlight his commitment to advancing technology. Lin continues to be a significant figure in the realm of semiconductor innovations.

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