The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Apr. 09, 2015
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Lin Cui, Dublin, CA (US);
Jason Daejin Park, San Jose, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/76 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23C 16/505 (2006.01);
U.S. Cl.
CPC ...
C23C 16/455 (2013.01); C23C 16/4404 (2013.01); C23C 16/4583 (2013.01); C23C 16/466 (2013.01); C23C 16/505 (2013.01); C23C 16/52 (2013.01);
Abstract
Methods and apparatuses for conditioning chambers using a two-stage process involving a low bias and a high bias stage are provided. Methods also involve clamping a protective electrostatic chuck cover to a pedestal by applying a bias to the electrostatic chuck during the high bias stage while cooling the protective electrostatic chuck cover, such as by flowing helium to the backside of the cover.