Company Filing History:
Years Active: 2003-2006
Title: The Innovative Contributions of Lily Yao
Introduction
Lily Yao is a prominent inventor based in Newark, CA (US). She has made significant contributions to the field of chemical mechanical planarization (CMP), particularly in the manufacturing of integrated circuits. With a total of 3 patents, her work has advanced the technology used in semiconductor fabrication.
Latest Patents
Lily Yao's latest patents include compositions for chemical mechanical planarization of tantalum and tantalum nitride. This invention focuses on compositions that enhance the CMP process for barrier and adhesion layers in integrated circuits. The CMP compositions consist of an aqueous solution of oxidizer and colloidal silica abrasive, utilizing oxidizers such as hydroxylamine nitrate and nitric acid.
Another notable patent involves compositions for chemical mechanical planarization of copper. This invention describes copper CMP slurries that include an oxidizer, hydroxylamine compounds, and abrasives. The formulations may also incorporate corrosion inhibitors and free radical inhibitors to improve performance during the CMP process.
Career Highlights
Throughout her career, Lily Yao has worked with notable companies such as EKC Technology Inc. and Da Nanomaterials LLC. Her experience in these organizations has contributed to her expertise in CMP technologies and innovations.
Collaborations
Lily has collaborated with several professionals in her field, including Robert J. Small and Maria L. Peterson. These collaborations have further enriched her work and expanded her contributions to the industry.
Conclusion
Lily Yao's innovative work in chemical mechanical planarization has made a significant impact on semiconductor manufacturing. Her patents reflect her dedication to advancing technology in this critical field.