Taipei, Taiwan

Lilin Chang

This inventor holds 4 USPTO granted patents and 8 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2017-2026.

USPTO Granted Patents = 4 

% Patents Active = 75.0

Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2017-2026

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4 patents (USPTO):Explore Patents

Title: Lilin Chang: Innovator in Lithography Techniques

Introduction

Lilin Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of lithography, particularly in developing advanced patterning techniques. With a total of 4 patents to his name, Chang's work is recognized for its innovative approaches to lithography compositions.

Latest Patents

Chang's latest patents focus on lithography patterning techniques. One of his notable inventions is a lithography developing composition that includes an alkaline aqueous solution containing a quaternary ammonium hydroxide with both a steric functional group and an electron-withdrawing group on its side chains. Another patent describes a composition that comprises an alkaline aqueous solution with two organic bases, where the first is a quaternary ammonium hydroxide with pendant groups, and the second is another quaternary ammonium hydroxide featuring electron-withdrawing groups. Additionally, he has developed a composition that utilizes an organic base with basicity weaker than Tetramethylammonium hydroxide (TMAH), showcasing his innovative approach to lithography.

Career Highlights

Lilin Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of lithography technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Chang collaborates with various professionals in his field, including his coworker Ching-Yu Chang. Their combined expertise contributes to the advancement of lithography techniques and the development of new technologies.

Conclusion

Lilin Chang is a key figure in the field of lithography, with a focus on innovative developing compositions. His contributions through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his importance in the semiconductor industry.

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