Lihua Li Huang

Title: Innovations by Lihua Li Huang: A Journey Through Patents and Collaborations

Introduction

Lihua Li Huang, based in San Jose, CA, is a notable inventor recognized for his innovative contributions in the field of semiconductor technology. With a total of two patents to his name, Huang has formulated methods that enhance the production and efficiency of interconnect structures in electronic devices.

Latest Patents

Huang's recent patents showcase his deep involvement in developing cutting-edge techniques. The first patent, titled "Method of forming a low-K dual damascene interconnect structure," outlines a detailed method for fabricating an interconnect structure by etching vias into dielectric layers. This process highlights a sophisticated approach to achieving low-K dielectric dual damascene structures, which are crucial for modern electronics.

The second patent focuses on a "Low temperature process to produce low-K dielectrics with low stress by plasma-enhanced chemical vapor deposition (PECVD)." This innovation allows for the formation of low-K dielectric films with minimal mechanical stress, utilizing low-temperature plasma-assisted techniques. This is particularly significant in improving the reliability and performance of electronic components.

Career Highlights

Lihua Li Huang currently works at Applied Materials, Inc., a leading company in the field of semiconductor and display technology. His work is pivotal in pushing the boundaries of how materials are used in electronics, contributing to advancements that benefit a wide range of industries.

Collaborations

In his professional journey, Huang has collaborated with colleagues such as Li-Qun Xia and Kang Sub Yim. These partnerships illustrate the collaborative spirit often found in research and development environments, where diverse expertise converges to drive innovation forward.

Conclusion

Lihua Li Huang's contributions to the world of semiconductors and low-K dielectric technology mark significant strides in electronic manufacturing. His patents not only reflect his expertise but also serve as valuable resources for ongoing research and advancements in the field. Through his collaborative efforts and innovative approaches, Huang continues to play a vital role in shaping the future of technology.