Company Filing History:
Years Active: 2010-2011
Title: Lieve Vandezande: Innovator in Titanium Nitride Film Technology
Introduction
Lieve Vandezande is a prominent inventor based in Oud-Heverlee, Belgium. She has made significant contributions to the field of materials science, particularly in the development of titanium nitride (TiN) films. With a total of 2 patents, her work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Lieve Vandezande's latest patents focus on the deposition of TiN films in a batch reactor. The first patent describes a method where titanium chloride (TiCl) and ammonia (NH) are used as precursors. In this process, TiCl is introduced into the reactor in temporally separated pulses. The ammonia can also be introduced in a similar manner, either alternating with the TiCl pulses or continuously while the TiCl is pulsed. The resulting TiN films exhibit low resistivity and good uniformity. The second patent reiterates this innovative approach, emphasizing the effectiveness of chemical vapor deposition in achieving high-quality TiN films.
Career Highlights
Lieve Vandezande is currently employed at ASM International N.V., a company known for its advanced semiconductor equipment and materials. Her work at ASM has positioned her as a key player in the development of cutting-edge technologies in the semiconductor industry.
Collaborations
Throughout her career, Lieve has collaborated with notable colleagues, including Albert Hasper and Gert-Jan Snijders. These collaborations have further enhanced her research and development efforts in the field of materials science.
Conclusion
Lieve Vandezande's contributions to the field of titanium nitride film technology highlight her innovative spirit and dedication to advancing materials science. Her patents reflect a commitment to developing efficient processes that have significant implications for the semiconductor industry.