The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2010
Filed:
Dec. 04, 2006
Albert Hasper, Meppel, NL;
Gert-jan Snijders, Amersfoort, NL;
Lieve Vandezande, Oud-Heverlee, BE;
Marinus J. DE Blank, Heverlee, BE;
Radko Gerard Bankras, Enschede, NL;
Albert Hasper, Meppel, NL;
Gert-Jan Snijders, Amersfoort, NL;
Lieve Vandezande, Oud-Heverlee, BE;
Marinus J. De Blank, Heverlee, BE;
Radko Gerard Bankras, Enschede, NL;
ASM International N.V., , NL;
Abstract
Titanium nitride (TiN) films are formed in a batch reactor using titanium chloride (TiCl) and ammonia (NH) as precursors. The TiClis flowed into the reactor in temporally separated pulses. The NHcan also be flowed into the reactor in temporally spaced pulses which alternate with the TiClpulses, or the NHcan be flowed continuously into the reactor while the TiClis introduced in pulses. The resulting TiN films exhibit low resistivity and good uniformity.