Singapore, Singapore

Lieng Loo

USPTO Granted Patents = 7 

Average Co-Inventor Count = 3.3

ph-index = 1


Location History:

  • Shenzhen, CN (2021)
  • Singapore, SG (2020 - 2023)

Company Filing History:


Years Active: 2020-2023

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7 patents (USPTO):Explore Patents

Title: Lieng Loo: Innovator in Planarization Methods

Introduction

Lieng Loo is a notable inventor based in Singapore, SG. He has made significant contributions to the field of technology, particularly in the area of planarization methods. With a total of 7 patents to his name, Loo continues to push the boundaries of innovation.

Latest Patents

One of Loo's latest patents is a planarization method designed to enhance the local flatness of products during processing. This invention involves a product that contains a cavity filled with oxide, which includes a first electrode layer, a piezoelectric layer, and a second electrode layer superposed on the cavity. The first electrode layer covers the cavity and features a first inclined face around it. The piezoelectric layer is arranged on top of the first electrode layer. The method includes depositing a passivation layer on the second electrode layer and etching it completely until the thickness is reduced to the required level. This innovative approach aims to achieve more uniform flatness in the final product.

Career Highlights

Throughout his career, Lieng Loo has worked with prominent companies such as AAC Acoustic Technologies (Shenzhen) Co., Ltd. and AAC Technologies Pte. Ltd. His experience in these organizations has contributed to his expertise in developing advanced technologies.

Collaborations

Loo has collaborated with talented individuals in his field, including Kahkeen Lai and Wooicheang Goh. These partnerships have likely fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Lieng Loo is a distinguished inventor whose work in planarization methods has made a significant impact in technology. His contributions, along with his collaborations and career experiences, highlight his dedication to innovation and excellence in his field.

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