Company Filing History:
Years Active: 1999-2008
Title: Lien-Sheng Chung: Innovator in Photoresist Removal Technologies
Introduction
Lien-Sheng Chung is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of photoresist removal technologies. With a total of 3 patents to his name, Chung's work has been instrumental in advancing the efficiency and effectiveness of semiconductor processes.
Latest Patents
Chung's latest patents include innovative methods for removing photoresist and pad nodules. The first patent, titled "Method of Removing Photoresist and Photoresist Rework Method," describes a process that eliminates the need for plasma in photoresist removal. Instead, it utilizes a two-step solution approach, where a first solution with a higher polarity is used to initiate the removal, followed by a second solution to completely eliminate the photoresist layer.
The second patent, "Method for Removing Pad Nodules," outlines a technique for addressing pad nodules formed on metal pads, specifically those made from aluminum or aluminum-copper alloys. This method involves dipping the wafer into deionized water to remove the nodules, followed by spin-drying and coating with an alkaloid developer for further removal.
Career Highlights
Lien-Sheng Chung is currently employed at United Microelectronics Corporation, a leading semiconductor foundry. His work at the company has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of semiconductor technologies.
Collaborations
Chung has collaborated with several talented individuals in his field, including Chi-Hung Wei and Hsin-Hsu Lin, who is a prominent female engineer. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Lien-Sheng Chung's contributions to the semiconductor industry through his patents and collaborative efforts highlight his role as an innovator in photoresist removal technologies. His work continues to influence the efficiency of semiconductor manufacturing processes.