Lake Oswego, OR, United States of America

Lie Zhao

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2016-2025

Loading Chart...
4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Lie Zhao

Introduction

Lie Zhao is a notable inventor based in Lake Oswego, OR (US), recognized for his significant contributions to the field of semiconductor technology. With a total of 4 patents to his name, Zhao has made strides in improving the efficiency and effectiveness of various materials used in the industry.

Latest Patents

Zhao's latest patents showcase his innovative approach to enhancing semiconductor processes. One of his notable inventions is the "Inert gas implantation for hard mask selectivity improvement." This patent describes a method for creating an amorphous carbon hard mask that possesses low hydrogen content and low sp3 carbon bonding while maintaining high modulus and hardness. The process involves depositing an amorphous carbon layer at low temperatures in a plasma deposition chamber, followed by a dual plasma-thermal treatment. This treatment includes exposing the layer to inert gas plasma, which implants an inert gas species into the amorphous carbon layer, and subsequently exposing it to high temperatures. The resulting hard mask exhibits high etch selectivity relative to underlying materials.

Another significant patent is the "Method for selectively sealing ultra low-k porous dielectric layer using flowable dielectric film formed from vapor phase dielectric precursor." This invention focuses on the pore sealing of porous dielectric films using flowable dielectric material. The method entails exposing a substrate with an exposed porous dielectric film to a vapor phase dielectric precursor, allowing the flowable dielectric material to selectively deposit in the pores without forming a continuous film on any exposed metal surface.

Career Highlights

Lie Zhao is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his innovative ideas and contribute to advancements in semiconductor manufacturing processes.

Collaborations

Zhao collaborates with talented individuals such as Artur Kolics and Nerissa Sue Draeger, who contribute to the dynamic environment of innovation at Lam Research Corporation.

Conclusion

Lie Zhao's inventive spirit and dedication to improving semiconductor technology are evident through his patents and contributions to Lam Research Corporation. His work continues to influence the industry and pave the way for future innovations.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…