Liang-Tang Wang

Title: Innovations of Liang-Tang Wang

Introduction

Liang-Tang Wang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for forming polycrystalline silicon films and thin film transistors. With a total of 4 patents to his name, Wang's work has had a substantial impact on the industry.

Latest Patents

Wang's latest patents include a "Method of Direct Deposition of Polycrystalline Silicon." This innovative method involves forming a polysilicon film in a plasma-assisted chemical vapor deposition (CVD) system. The process includes providing a substrate on a second electrode, applying power to generate plasma, and flowing an erosive gas into the chamber. Another notable patent is the "Method of Forming Poly-Silicon Thin Film Transistors." This method describes the formation of an amorphous silicon thin film transistor on a substrate, followed by an infrared heating process that crystallizes the amorphous silicon layer into poly-silicon, resulting in a functional thin film transistor.

Career Highlights

Liang-Tang Wang is affiliated with the Industrial Technology Research Institute, where he continues to advance research in semiconductor technologies. His innovative approaches have positioned him as a key figure in the development of advanced materials and processes in the industry.

Collaborations

Wang has collaborated with notable colleagues such as Shun-Fa Huang and Chi-Lin Chen. Their combined expertise has contributed to the success of various projects and innovations in the field.

Conclusion

Liang-Tang Wang's contributions to semiconductor technology through his patents and research have established him as a leading inventor in his field. His innovative methods for forming polycrystalline silicon and thin film transistors continue to influence advancements in technology.