Company Filing History:
Years Active: 2021-2025
Title: Innovations of Inventor Liang Chen
Introduction
Liang Chen is a notable inventor based in Chongqing, China. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to electronic devices.
Latest Patents
One of his latest patents is the "MOS device with resistive field plate for realizing conductance modulation field effect." This invention enhances the existing trench gate MOS device by incorporating a semi-insulating resistive field plate. This addition allows for better control over the on-off state of the MOS channel and modulates the conductance of the drift region, ultimately leading to lower on-resistance. The use of modern 2.5-dimensional processing technology based on deep trench etching further supports the miniaturization and high-density design of semiconductor structures, aligning with the More than Moore development trend.
Another significant patent is the "Chip ESD protection circuit." This invention includes an integrated circuit layer and a conductive layer, designed to improve the ESD protection capability of a chip. The circuit features ground bonding pads connected to power domains, enhancing the chip's reliability while reducing its occupied area.
Career Highlights
Liang Chen has worked with prominent organizations, including China Electronic Technology Corporation and the 24th Research Institute of China Electronics Technology Group Corporation. His experience in these institutions has contributed to his expertise in semiconductor innovations.
Collaborations
Throughout his career, Liang has collaborated with notable colleagues such as Yan Wang and Tao Liu. Their combined efforts have further advanced the field of semiconductor technology.
Conclusion
Liang Chen's contributions to semiconductor technology through his innovative patents demonstrate his commitment to advancing electronic device capabilities. His work continues to influence the industry and pave the way for future developments.